Substrate processing apparatus, substrate processing method, and substrate holding apparatus
US7578886B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 28, 2004 |
| Grant date | Aug 25, 2009 |
| Priority date | — |
| Expiry date | Apr 8, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B2203/0288
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus and a substrate processing method is provided for performing a chemical liquid process, a cleaning process, a drying process, or the like while rotating a substrate such as a semiconductor wafer or a liquid crystal substrate. A substrate holding apparatus is provided for holding and rotating a substrate. The substrate processing apparatus for processing a substrate while supplying a fluid to the substrate includes a substrate holder for holding and rotating the substrate, and a holder suction unit for sucking the fluid from the substrate holder. The substrate holding apparatus includes a plurality of rollers which are brought into contact with an edge portion of a substrate so as to hold and rotate the substrate, and at least one moving mechanism for moving the rollers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.