Methods and systems for trapping ion beam particles and focusing an ion beam
US7598495B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2007 |
| Grant date | Oct 6, 2009 |
| Priority date | — |
| Expiry date | Mar 24, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/049
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A focusing particle trap system for ion implantation comprising an ion beam source that generates an ion beam, a beam line assembly that receives the ion beam from the ion beam source comprising a mass analyzer that selectively passes selected ions, a focusing electrostatic particle trap that receives the ion beam and removes particles from the ion beam comprising an entrance electrode comprising an entrance aperture and biased to a first base voltage, wherein the first surface of the entrance electrode is facing away from a center electrode and is approximately flat, wherein the second surface of the entrance electrode is facing toward the center electrode and is concave, wherein the center electrode is positioned a distance downstream from the entrance electrode comprising a center aperture and biased to a center voltage, wherein the center voltage is less than the first base voltage, wherein the first surface of the center electrode is facing toward the entrance electrode and is convex, wherein the second surface of the center electrode is facing away from the entrance electrode and is approximately flat, an exit electrode positioned a distance downstream from the center electro…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.