Plasma source and plasma processing apparatus
US7632379B2 · kind B2 · utility
17Cited by
1References
12Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | May 28, 2004 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | Dec 13, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32596
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.