Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction
US7716003B1 · kind B1 · utility
23Cited by
9References
14Claims
0Family size
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Key dates
| Filing date | Jul 16, 2007 |
| Grant date | May 11, 2010 |
| Priority date | — |
| Expiry date | Jan 3, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present application discloses a new technique which reduces the dimensionality of a feature model by re-use of data that has been obtained by a prior measurement. The data re-used from the prior measurement may range from parameters, such as geometrical dimensions, to more complex data that describe the electromagnetic scattering function of an underlying layer (for example, a local solution of the electric field properties).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.