Method and apparatus for increasing metrology or inspection tool throughput
US7724375B1 · kind B1 · utility
7Cited by
3References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2008 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Nov 15, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B9/02063
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system for performing measurements on a test sample with a metrology or inspection tool are disclosed. At least one of the test sample and the tool is moved with respect to the other from a first position to a second position. At the second position, the tool is aligned for measurement of a measurement target on the sample. A focus of the tool on the test sample is adjusted while moving from that first position to the second position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.