Method for removing contamination from a substrate and for making a cleaning solution
US7737097B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 3, 2006 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Nov 29, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/42
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method is provided for removing contamination from a substrate. The method includes applying a cleaning solution having a dispersed phase, a continuous phase and particles dispersed within the continuous phase to a surface of the substrate. The method includes forcing one of the particles dispersed within the continuous phase proximate to one of the surface contaminants. The forcing is sufficient to overcome any repulsive forces between the particles and the surface contaminants so that the one of the particles and the one of the surface contaminants are engaged. The method also includes removing the engaged particle and surface contaminant from the surface of the substrate. A process to manufacture the cleaning material is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.