Inventor · San Jose, CA, US

Mikhail Korolik

67Patents
16h-index
68Co-inventors
87Inventor score

Filing activity: Jan 4, 2000 → Oct 11, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US9275834B1 Selective titanium nitride etch Electricity 519 Active
US9449843B1 Selectively etching metals and metal nitrides conformally Chemistry; Metallurgy 349 Active
US8951429B1 Tungsten oxide processing Electricity 210 Active
US9111877B2 Non-local plasma oxide etch Electricity 179 Active
US9236265B2 Silicon germanium processing Electricity 164 Active
US9355862B2 Fluorine-based hardmask removal Electricity 147 Active
US9478434B2 Chlorine-based hardmask removal Electricity 133 Active
US9355863B2 Non-local plasma oxide etch Electricity 130 Active
US9576809B2 Etch suppression with germanium Electricity 129 Active
US9831097B2 Methods for selective etching of a silicon material using HF gas without nitrogen etchants Electricity 99 Active
US10043674B1 Germanium etching systems and methods Electricity 97 Active
US10043684B1 Self-limiting atomic thermal etching systems and methods Electricity 93 Active
US6534381B2 Method for fabricating multi-layered substrates Electricity 74 Expired
US7367345B1 Apparatus and method for providing a confined liquid for immersion lithography Emerging Cross-Sectional Technologies 40 Expired
US10177227B1 Method for fabricating junctions and spacers for horizontal gate all around devices Electricity 25 Active
US7383843B2 Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer Emerging Cross-Sectional Technologies 16 Expired
US7749689B2 Methods for providing a confined liquid for immersion lithography Emerging Cross-Sectional Technologies 9 Active
US8287647B2 Apparatus and method for atomic layer deposition Electricity 9 Active
US7737097B2 Method for removing contamination from a substrate and for making a cleaning solution Physics 8 Active
US7204639B1 Method and apparatus for thin metal film thickness measurement Physics 7 Expired
US7799141B2 Method and system for using a two-phases substrate cleaning compound Electricity 7 Active
US7862662B2 Method and material for cleaning a substrate Physics 7 Active
US7696141B2 Cleaning compound and method and system for using the cleaning compound Electricity 7 Active
US7632376B1 Method and apparatus for atomic layer deposition (ALD) in a proximity system Electricity 7 Active
US8475599B2 Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutions Electricity 6 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.