Plasma processing apparatus
US7744721B2 · kind B2 · utility
4Cited by
6References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2009 |
| Grant date | Jun 29, 2010 |
| Priority date | — |
| Expiry date | Sep 25, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus including a processing chamber for subjecting an object to plasma processing, a gas inlet, an evacuation device, a sample stage for the object, a power supply, and at least one induction coil. The at least one induction coil enables generation of the plasma in the processing chamber and is formed by connecting a plurality of identical coil elements in a parallel circuit-like arrangement so that current flows in each of the plurality of identical coil elements in a same direction when viewed from the sample stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.