Ampoule for liquid draw and vapor draw with a continuous level sensor

US7775508B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Kenric Choi · Santa Clara, US
• Pravin K. Narwankar · Sunnyvale, US
• Shreyas Kher · Campbell, US
• Son T. Nguyen · San Jose, US
• Paul Deaton · San Jose, US
• Khai Ngo · Austin, US
• Paul Chhabra · Austin, US
• Alan Ouye · San Mateo, US
• Dien-Yeh Wu · San Jose, US

Key dates

• Filing date: Oct 31, 2006
• Grant date: Aug 17, 2010
• Expiry date: Jun 17, 2029

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/4481
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.