Graded ARC for high NA and immersion lithography
US7776516B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2006 |
| Grant date | Aug 17, 2010 |
| Priority date | — |
| Expiry date | Aug 13, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming a device using a graded anti-reflective coating is provided. One or more amorphous carbon layers are formed on a substrate. An anti-reflective coating (ARC) is formed on the one or more amorphous carbon layers wherein the ARC layer has an absorption coefficient that varies across the thickness of the ARC layer. An energy sensitive resist material is formed on the ARC layer. An image of a pattern is introduced into the layer of energy sensitive resist material by exposing the energy sensitive resist material to patterned radiation. The image of the pattern introduced into the layer of energy sensitive resist material is developed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.