Gas baffle and distributor for semiconductor processing chamber
US7799704B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2008 |
| Grant date | Sep 21, 2010 |
| Priority date | — |
| Expiry date | Oct 31, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4404
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus and methods for distributing gas in a semiconductor process chamber are provided. In an embodiment, a gas distributor for use in a gas processing chamber comprises a body. The body includes a baffle with a gas deflection surface to divert the flow of a gas from a first direction to a second direction. The gas deflection surface comprises a concave surface. The concave surface comprises at least about 75% of the surface area of the gas deflection surface. The concave surface substantially deflects the gas toward a chamber wall and provides decreased metal atom contamination from the baffle so that season times can be reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.