Sanjay Kamath
18Patents
5h-index
69Co-inventors
65Inventor score
Filing activity: Nov 28, 2006 → Jul 30, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7967913B2 | Remote plasma clean process with cycled high and low pressure clean steps | Chemistry; Metallurgy | 459 | Active |
| US9362107B2 | Flowable low-k dielectric gapfill treatment | Electricity | 407 | Active |
| US7740706B2 | Gas baffle and distributor for semiconductor processing chamber | Electricity | 13 | Active |
| US7799704B2 | Gas baffle and distributor for semiconductor processing chamber | Chemistry; Metallurgy | 9 | Active |
| US10410869B2 | CVD based oxide-metal multi structure for 3D NAND memory devices | Electricity | 6 | Active |
| US7704897B2 | HDP-CVD SiON films for gap-fill | Electricity | 5 | Active |
| US11217443B2 | Sequential deposition and high frequency plasma treatment of deposited film on patterned and un-patterned substrates | Electricity | 0 | Active |
| US11817320B2 | CVD based oxide-metal multi structure for 3D NAND memory devices | Electricity | 0 | Active |
| US11430654B2 | Initiation modulation for plasma deposition | Electricity | 0 | Active |
| US12094709B2 | Plasma treatment process to densify oxide layers | Electricity | 0 | Active |
| US10950430B2 | Pulsed plasma deposition etch step coverage improvement | Electricity | 0 | Active |
| US11157661B2 | Process development visualization tool | Physics | 0 | Active |
| US12040210B2 | Multi-pressure bipolar electrostatic chucking | Electricity | 0 | Active |
| US11270903B2 | Multi zone electrostatic chuck | Electricity | 0 | Active |
| US11817313B2 | Methods for pressure ramped plasma purge | Electricity | 0 | Active |
| US11776835B2 | Power supply signal conditioning for an electrostatic chuck | Electricity | 0 | Active |
| US11600468B2 | Multi channel splitter spool | Electricity | 0 | Active |
| US11538677B2 | Systems and methods for depositing high density and high tensile stress films | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.