Method and apparatus for EUV plasma source target delivery
US7838854B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 25, 2008 |
| Grant date | Nov 23, 2010 |
| Priority date | — |
| Expiry date | Feb 27, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/007
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.