Methods and apparatus for generating a library of spectra
US7840375B2 · kind B2 · utility
9Cited by
50References
23Claims
0Family size
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Key dates
| Filing date | Mar 31, 2008 |
| Grant date | Nov 23, 2010 |
| Priority date | — |
| Expiry date | Aug 31, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67766
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of generating a library from a reference substrate for use in processing product wafers is described. The method includes measuring substrate characteristics at a plurality of well-defined points of a reference substrate, measuring spectra at plurality of measurement points of the reference substrate, there being more measurement points than well-defined points, and associating measured spectra with measured substrate characteristics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.