Unique passivation technique for a CVD blocker plate to prevent particle formation
US7857947B2 · kind B2 · utility
2Cited by
11References
17Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 24, 2006 |
| Grant date | Dec 28, 2010 |
| Priority date | — |
| Expiry date | Mar 19, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/9029
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Blocker plates for chemical vapor deposition chambers and methods of treating blocker plates are provided. The blocker plates define a plurality of holes therethrough and have an upper surface and a lower surface that are at least about 99.5% pure, which minimizes the nucleation of contaminating particles on the blocker plates. A physically vapor deposited coating, such as an aluminum physically vapor deposited coating, may be formed on the upper and lower surfaces of the blocker plates. Chemical vapor deposition chambers including blocker plates having a physically vapor deposited coating thereon are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.