Method and material for cleaning a substrate
US7862662B2 · kind B2 · utility
7Cited by
102References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2006 |
| Grant date | Jan 4, 2011 |
| Priority date | — |
| Expiry date | Mar 11, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/82
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causing the particle to be removed along with the tri-state body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.