Systems and methods for target material delivery in a laser produced plasma EUV light source

US7872245B2 · kind B2 · utility

Assignee

• Cymer, LLC · US

Inventors

• Georgiy O. Vaschenko · San Diego, US
• Alexander N. Bykanov · San Diego, US
• Norbert Bowering · San Diego, US
• David C. Brandt · San Diego, US
• Alexander I. Ershov · Escondido, US
• Rodney D. Simmons · San Diego, US
• Oleh Khodykin · San Diego, US
• Igor V. Fomenkov · San Diego, US

Key dates

• Filing date: Jun 19, 2008
• Grant date: Jan 18, 2011
• Expiry date: Jul 30, 2029

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05G2/0094
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.