Apparatus and method for front side protection during backside cleaning

US7879183B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Imad Yousif · San Jose, US
• Ying Rui · Meridian, US
• Nancy Fung · Sunnyvale, US
• Martin Jeffrey Salinas · Campbell, US
• Ajit Balakrishna · Sunnyvale, US
• Anchel Sheyner · San Francisco, US
• Shahid Rauf · Pleasanton, US
• Walter R. Merry · Cupertino, US

Key dates

• Filing date: Feb 27, 2008
• Grant date: Feb 1, 2011
• Expiry date: May 8, 2028

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B05B1/18
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

Embodiments of the present invention provide apparatus and method for front side protection while processing side and backside of a substrate. One embodiment of the present invention provides a showerhead configured to provide a purge gas to a front side of a substrate during a backside etch processing. The showerhead comprises a body configured to be disposed over the front side of the substrate. The body has a process surface configured to face the front side of the substrate. The process surface has an outer circular region, a central region, a middle region between the outer central region and the central region. The first plurality of holes are distributed in the outer circular region and configured to direct the purge gas towards an edge area of the front side of the substrate. No gas delivery hole is distributed within a substantial portion of the middle region.