System and method for making photomasks
US7930656B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 14, 2007 |
| Grant date | Apr 19, 2011 |
| Priority date | — |
| Expiry date | Apr 3, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure is directed a method for preparing photomask patterns. The method comprises receiving drawn pattern data for a design database. The drawn pattern data describes first device features and second device features, the second device features being associated with design specifications for providing a desired connectivity of the first device features to the second device features. At least a first plurality of the first device features have drawn patterns that will not result in sufficient coverage to effect the desired connectivity. Photomask patterns are formed for the first device features, wherein the photomask patterns for the first plurality of the first device features will result in the desired coverage. Integrated circuit devices formed using the principles of the present disclosure are also taught.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.