Method for determining intensity distribution in the image plane of a projection exposure arrangement
US7961297B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 2, 2006 |
| Grant date | Jun 14, 2011 |
| Priority date | — |
| Expiry date | Mar 26, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.