Apparatus and methods for conditioning a polishing pad
US7963826B2 · kind B2 · utility
6Cited by
49References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2009 |
| Grant date | Jun 21, 2011 |
| Priority date | — |
| Expiry date | Dec 11, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B53/12
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Apparatus and methods for conditioning a polishing pad include an arm adapted to support a conditioning disk; a drive mechanism coupled to the arm; and a flexible coupling between the drive mechanism and the conditioning disk adapted to allow the conditioning disk to tilt while transmitting rotary motion from the drive mechanism to the conditioning disk. Numerous other aspects are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.