Plasma processing apparatus
US7972469B2 · kind B2 · utility
4Cited by
17References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 22, 2007 |
| Grant date | Jul 5, 2011 |
| Priority date | — |
| Expiry date | May 4, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32623
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a plasma control magnet assembly includes a plurality of magnets arranged in a predetermined pattern that generate a magnetic field having a strength greater than 10 Gauss in a region proximate the assembly and less than 10 Gauss in a region remote from the assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.