Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
US8111900B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 2010 |
| Grant date | Feb 7, 2012 |
| Priority date | — |
| Expiry date | May 15, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/95676
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Various computer-implemented methods are provided. One method for sorting defects in a design pattern of a reticle includes searching for defects of interest in inspection data using priority information associated with individual defects in combination with one or more characteristics of a region proximate the individual defects. The priority information corresponds to modulation levels associated with the individual defects. The inspection data is generated by comparing images of the reticle generated for different values of a lithographic variable. The images include at least one reference image and at least one modulated image. A composite reference image can be generated from two or more reference images. The method also includes assigning one or more identifiers to the defects of interest. The identifier(s) may include, for example, a defect classification and/or an indicator identifying if the defects of interest are to be used for further processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.