Specified position identifying method and specified position measuring apparatus
US8442300B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 8, 2007 |
| Grant date | May 14, 2013 |
| Priority date | — |
| Expiry date | Oct 10, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T7/0004
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A specified position in an array structure in which a reference pattern is displayed repetitively through reference pattern counting is identified. In an array structure image, the pattern detection estimating area generated from a starting point, the address of the starting point, and a unit vector are compared with a pattern detected position found in pattern matching with the reference pattern image, to execute pattern counting while determining correct detection, oversights, wrong detection, etc. Array structure images are photographed sequentially while moving the visual field with the use of an image shifting deflector to continue the pattern counting started at the starting point to identify the ending point specified with an address. If the ending point is not reached only with use of the image shifting deflector, the visual field moving range of the image shifting deflector is moved with use of a specimen stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.