Observation condition determination support device and observation condition determination support method
US8472696B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 19, 2009 |
| Grant date | Jun 25, 2013 |
| Priority date | — |
| Expiry date | Apr 27, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Provided is an observation condition determination support device which can improve the defect classification accuracy. The observation condition determination support device includes: a means (26) for acquiring a plurality of defects images which have captured the same defect under a plurality of observation conditions set in advance in an observation device (5) in accordance with check data relating to defects of a semiconductor device detected by an inspection device (4); a means (12) for classifying the plurality of the same defects according to the respective defect images and determining a first category to which the same defects belong for each of the observation conditions as a result of the classification; and a means (13) for determining an observation condition to be used when fabricating the semiconductor device among the plurality of the observation conditions according to the ratio at which the first category is matched with a second category determined by a user of the observation device who has classified the same defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.