Optical integrator for an illumination system of a microlithographic projection exposure apparatus

US8520307B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Oliver Wolf · Aalen, DE
• Heiko Siekmann · Aalen, DE
• Eva Kalchbrenner · Bopfingen, DE
• Siegfried Rennon · Würzburg, DE
• Johannes Wangler · Oberkochen, DE
• Andre Bresan · Aalen, DE
• Michael Gerhard · Aalen, DE
• Nils Haverkamp · Aalen, DE
• Axel Scholz · Aalen, DE
• Ralf Scharnweber · Aalen, DE
• Michael Layh · Altusried, DE
• Stefan Burkart · Rottenberg, DE

Key dates

• Filing date: Dec 20, 2010
• Grant date: Aug 27, 2013
• Expiry date: Apr 17, 2031

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T83/04
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.