Ralf Scharnweber
10Patents
2h-index
34Co-inventors
50Inventor score
Filing activity: Mar 16, 2005 → Nov 19, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8587767B2 | Illumination optics for EUV microlithography and related system and apparatus | Physics | 5 | Active |
| US8395756B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US7880969B2 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 2 | Active |
| US7561253B2 | Method for a multiple exposure, microlithography projection exposure installation and a projection system | Physics | 2 | Expired |
| US9946161B2 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Physics | 1 | Active |
| US8520307B2 | Optical integrator for an illumination system of a microlithographic projection exposure apparatus | Emerging Cross-Sectional Technologies | 1 | Active |
| US9217930B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 1 | Active |
| US7875418B2 | Method for a multiple exposure, microlithography projection exposure installation and a projection system | Physics | 1 | Active |
| US8634060B2 | Method for a multiple exposure, microlithography projection exposure installation and a projection system | Physics | 0 | Active |
| US9575414B2 | Illumination system for a microlithographic projection exposure apparatus | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.