Vertical film formation apparatus and method for using same
US8563096B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 26, 2010 |
| Grant date | Oct 22, 2013 |
| Priority date | — |
| Expiry date | Jul 4, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45546
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for using a vertical film formation apparatus includes performing a coating process inside the process container without product target objects present therein to cover an inner surface of the process container with a coating film, and then performing a film formation process inside the process container accommodating the holder with the product target objects placed thereon to form a predetermined film on the product target objects. The coating process alternately supplies the first and second process gases into the process container without turning either of the first and second process gases into plasma. The film formation process alternately supplies the first and second process gases into the process container while turning at least one of the first and second process gases into plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.