Pao-Hwa Chou
27Patents
12h-index
36Co-inventors
77Inventor score
Filing activity: Jun 27, 2005 → Jul 10, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8080290B2 | Film formation method and apparatus for semiconductor process | Electricity | 105 | Active |
| US7351668B2 | Film formation method and apparatus for semiconductor process | Electricity | 87 | Active |
| US7462571B2 | Film formation method and apparatus for semiconductor process for forming a silicon nitride film | Chemistry; Metallurgy | 80 | Active |
| US7300885B2 | Film formation apparatus and method for semiconductor process | Electricity | 80 | Expired |
| US8178448B2 | Film formation method and apparatus for semiconductor process | Electricity | 76 | Active |
| US7758920B2 | Method and apparatus for forming silicon-containing insulating film | Electricity | 76 | Active |
| US7507676B2 | Film formation method and apparatus for semiconductor process | Electricity | 74 | Active |
| US7964241B2 | Film formation method and apparatus for semiconductor process | Chemistry; Metallurgy | 72 | Active |
| US8034673B2 | Film formation method and apparatus for forming silicon-containing insulating film doped with metal | Electricity | 71 | Active |
| US8563096B2 | Vertical film formation apparatus and method for using same | Chemistry; Metallurgy | 31 | Active |
| US8673725B2 | Multilayer sidewall spacer for seam protection of a patterned structure | Electricity | 13 | Active |
| US8591989B2 | SiCN film formation method and apparatus | Chemistry; Metallurgy | 12 | Active |
| US8343594B2 | Film formation method and apparatus for semiconductor process | Chemistry; Metallurgy | 6 | Active |
| US7989354B2 | Patterning method | Electricity | 6 | Active |
| US8168375B2 | Patterning method | Electricity | 5 | Active |
| US8216648B2 | Film formation method and apparatus | Electricity | 4 | Active |
| US8025931B2 | Film formation apparatus for semiconductor process and method for using the same | Chemistry; Metallurgy | 3 | Active |
| US7718497B2 | Method for manufacturing semiconductor device | Electricity | 2 | Active |
| US8383522B2 | Micro pattern forming method | Electricity | 1 | Active |
| US8664102B2 | Dual sidewall spacer for seam protection of a patterned structure | Electricity | 1 | Active |
| US8658247B2 | Film deposition method | Electricity | 1 | Active |
| US7754622B2 | Patterning method utilizing SiBN and photolithography | Electricity | 1 | Active |
| US7959733B2 | Film formation apparatus and method for semiconductor process | Emerging Cross-Sectional Technologies | 0 | Active |
| US8734901B2 | Film deposition method and apparatus | Electricity | 0 | Active |
| US9460913B2 | Film-forming method for forming silicon oxide film on tungsten film or tungsten oxide film | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.