Illumination optics for EUV microlithography and related system and apparatus

US8587767B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Damian Fiolka · Oberkochen, DE
• Berndt Warm · Arnstorf, DE
• Christian Steigerwald · Greifenberg, DE
• Martin Endres · Oberkochen, DE
• Ralf Stuetzle · Aalen, DE
• Jens Ossmann · Aalen, DE
• Ralf Scharnweber · Aalen, DE
• Markus Hauf · Ulm, DE
• Udo Dinger · Oberkochen, DE
• Severin Waldis · Aalen, DE
• Marc Kirch · Wedel, DE
• Joachim Hartjes · Aalen, DE

Key dates

• Filing date: Oct 29, 2010
• Grant date: Nov 19, 2013
• Expiry date: Aug 27, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70083
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.