Aqueous cerium-containing solution having an extended bath lifetime for removing mask material
US8618036B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 14, 2011 |
| Grant date | Dec 31, 2013 |
| Priority date | — |
| Expiry date | Jan 3, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/426
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An aqueous solution of a cerium (IV) complex or salt having an extended lifetime is provided. In one embodiment, the extended lifetime is achieved by adding at least one booster additive to an aqueous solution of the cerium (IV) complex or salt. In another embodiment, the extended lifetime is achieved by providing an aqueous solution of a cerium (IV) complex or salt and a cerium (III) complex or salt. The cerium (III) complex or salt can be added or it can be generated in-situ by introducing a reducing agent into the aqueous solution of the cerium (IV) complex or salt. The aqueous solution can be used to remove a mask material, especially an ion implanted and patterned photoresist, from a surface of a semiconductor substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.