Lithographic apparatus and sensor therefor
US8629418B2 · kind B2 · utility
0Cited by
18References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2006 |
| Grant date | Jan 14, 2014 |
| Priority date | — |
| Expiry date | Feb 22, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.