Lithographic apparatus and device manufacturing method
US8730448B2 · kind B2 · utility
6Cited by
3References
19Claims
0Family size
Assignee
Inventors
- Han-Kwang Nienhuys
- Martinus Agnes Willem Cuijpers
- Nicolaas Ten Kate
- Leon Martin Levasier
- Jan Bernard Plechelmus Van Schoot
- Yuri Johannes Gabriël Van De Vijver
- Oleg Viacheslavovich Voznyi
- Franciscus Johannes Joseph Janssen
- Danny Maria Hubertus Philips
- Marcio Alexandre Cano Miranda
- Oleksiy Galaktionov
- Manish Ranjan
- Albert Pieter Rijpma
- Kursat Bal
- Laurentius Johannes Adrianus Van Bokhoven
- Roger W. Schmitz
- Alain Louis Claude Leroux
Key dates
| Filing date | Mar 1, 2012 |
| Grant date | May 20, 2014 |
| Priority date | — |
| Expiry date | Aug 10, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.