Method of differential counter electrode tuning in an RF plasma reactor
US8734664B2 · kind B2 · utility
23Cited by
7References
19Claims
0Family size
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Key dates
| Filing date | Aug 5, 2013 |
| Grant date | May 27, 2014 |
| Priority date | — |
| Expiry date | Aug 5, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2001
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of controlling distribution of a plasma parameter in a plasma reactor having an RF-driven electrode and two (or more) counter electrodes opposite the RF driven electrode and facing different portions of the process zones. The method includes providing two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and governing the variable reactances to change distribution of a plasma parameter such as plasma ion density or ion energy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.