Patent · US Active

Reticles, and methods of mitigating asymmetric lens heating in photolithography

US8845908B2 · kind B2 · utility

0Cited by

3References

24Claims

0Family size

Assignee

Micron Technology, Inc. · US

Inventors

Scott L. Light · Boise, US
Dan B. Millward · Boise, US
Yuan He · Boise, US
Kaveri Jain · Boise, US
Lijing Gou · Boise, US
Zishu Zhang · Boise, US
Anton J. deVilliers · Boise, US
Michael Hyatt · Boise, US
Jianming Zhou · Suzhou, CN

Key dates

Filing date	Aug 24, 2010
Grant date	Sep 30, 2014
Priority date	—
Expiry date	Aug 24, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imagable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imagable material. The reticle is then fabricated to include non-printing features within a non-printing region of the reticle which generate additional hot spot locations on the lens when using the reticle to pattern the photo-imagable material. Other implementations are contemplated, including reticles which may be independent of method of use or fabrication.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.