Systems, methods and apparatus for separate plasma source control
US8999104B2 · kind B2 · utility
1Cited by
44References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 6, 2010 |
| Grant date | Apr 7, 2015 |
| Priority date | — |
| Expiry date | Feb 21, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.