Illumination system of a microlithographic projection exposure apparatus

US9046786B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Michael Patra · Oberkochen, DE
• Stig Bieling · Aalen, DE
• Markus Deguenther · Aalen, DE
• Frank Schlesener · Oberkochen, DE
• Markus Schwab · Aalen, DE

Key dates

• Filing date: Sep 5, 2012
• Grant date: Jun 2, 2015
• Expiry date: Aug 2, 2033

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70058
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An illumination system of a microlithographic projection exposure apparatus includes a light source to produce projection light beam, and a first and a second diffractive optical element between the light source and a pupil plane of the illumination system. The diffractive effect produced by each diffractive optical element depends on the position of a light field that is irradiated by the projection light on the diffractive optical elements. A displacement mechanism changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism, the light field extends both over the first and the second diffractive optical element. This makes it possible to produce in a simple manner continuously variable illumination settings.