Patent · US Active

Imaging devices, methods of forming same, and methods of forming semiconductor device structures

US9140977B2 · kind B2 · utility

0Cited by

9References

20Claims

0Family size

Assignee

Micron Technology, Inc. · US

Inventors

Yuan He · Boise, US
Kaveri Jain · Boise, US
Lijing Gou · Boise, US
Zishu Zhang · Boise, US
Anton J. deVilliers · Boise, US
Michael Hyatt · Boise, US
Jianming Zhou · Suzhou, CN
Scott L. Light · Boise, US
Dan B. Millward · Boise, US

Key dates

Filing date	May 13, 2013
Grant date	Sep 22, 2015
Priority date	—
Expiry date	Nov 6, 2033

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/49002
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An imaging device comprising a first region and a second region. Imaging features in the first region and assist features in the second region are substantially the same size as one another and are formed substantially on pitch. Methods of forming an imaging device and methods of forming a semiconductor device structure are also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.