Projection exposure system and projection exposure method

US9146475B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Paul Graupner · Aalen, DE
• Olaf Conradi · Sonthofen, DE
• Christoph Zaczek · Heubach, DE
• Wilhelm Ulrich · Aalen, DE
• Helmut Beierl · Heidenheim, DE
• Toralf Gruner · Hennef (Sieg), DE
• Volker Graeschus · Aalen, DE

Key dates

• Filing date: Mar 5, 2013
• Grant date: Sep 29, 2015
• Expiry date: Feb 8, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70308
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.