Lithographic apparatus and device manufacturing method involving a member and a fluid opening
US9152058B2 · kind B2 · utility
0Cited by
81References
19Claims
0Family size
Assignee
Inventors
- Joeri Lof
- Erik Theodorus Maria Bijlaart
- Roelof Aeilko Siebrand Ritsema
- Frank Van Schaik
- Timotheus Franciscus Sengers
- Klaus Simon
- Joannes Theodoor De Smit
- Arie Jeffrey Den Boef
- Hans Butler
- Sjoerd Nicolaas Lambertus Donders
- Christiaan Alexander Hoogendam
- Marcus Adrianus Van De Kerkhof
- Aleksey Yurievich Kolensnychenko
- Mark Kroon
- Erik Roelof Loopstra
- Hendricus Johannes Maria Meijer
- Jeroen Johannes Sophia Maria Mertens
- Johannes Catharinus Hubertus Mulkens
- Joost Jeroen Ottens
- Alexander Straaijer
- Bob Streefkerk
- Helmar Van Santen
Key dates
| Filing date | Jul 29, 2011 |
| Grant date | Oct 6, 2015 |
| Priority date | — |
| Expiry date | Nov 12, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.