Distributed multi-zone plasma source systems, methods and apparatus
US9155181B2 · kind B2 · utility
0Cited by
48References
12Claims
0Family size
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Key dates
| Filing date | Aug 6, 2010 |
| Grant date | Oct 6, 2015 |
| Priority date | — |
| Expiry date | Nov 15, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2242/26
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.