Patent · US Active

Independent control of RF phases of separate coils of an inductively coupled plasma reactor

US9161428B2 · kind B2 · utility

7Cited by

11References

17Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Kenneth S. Collins · San Jose, US
Satoru Kobayashi · Tokyo, JP
Lawrence Wong · Fremont, US
Jonathan Liu · Sunnyvale, US
Yang Yang · San Diego, US
Kartik Ramaswamy · San Jose, US
Shahid Rauf · Pleasanton, US

Key dates

Filing date	Mar 14, 2013
Grant date	Oct 13, 2015
Priority date	—
Expiry date	Mar 5, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH05H2242/26
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Plasma distribution is controlled in a plasma reactor by controlling the phase differences between different RF coil antennas, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.