Auto-sequencing multi-directional inline processing method
US9287152B2 · kind B2 · utility
3Cited by
99References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 20, 2013 |
| Grant date | Mar 15, 2016 |
| Priority date | — |
| Expiry date | Jan 27, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49948
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for auto-sequencing of plasma processing system for concurrent processing of several substrates. The method autonomously sequence processing and move substrates in different directions as necessary. The method moves two substrate trays together into the processing chamber for substrate exchange, and remove the trays from the chamber one at a time. When needed, the method moves one tray into the processing chamber for removal of the susceptor without exposing the chamber to atmospheric environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.