Multiple complementary gas distribution assemblies

US9303318B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Tuoh Bin Ng · Hsinchu, TW
• Yuriy Melnik · San Jose, US
• Lily Pang · Fremont, US
• Eda Tuncel · Menlo Park, US
• Lu Chen · Pingtung City, TW
• Son T. Nguyen · San Jose, US

Key dates

• Filing date: Oct 11, 2012
• Grant date: Apr 5, 2016
• Expiry date: Oct 17, 2033

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T137/8593
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In one embodiment, an apparatus includes a first gas distribution assembly that includes a first gas passage for introducing a first process gas into a second gas passage that introduces the first process gas into a processing chamber and a second gas distribution assembly that includes a third gas passage for introducing a second process gas into a fourth gas passage that introduces the second process gas into the processing chamber. The first and second gas distribution assemblies are each adapted to be coupled to at least one chamber wall of the processing chamber. The first gas passage is shaped as a first ring positioned within the processing chamber above the second gas passage that is shaped as a second ring positioned within the processing chamber. The gas distribution assemblies may be designed to have complementary characteristic radial film growth rate profiles.