Microlithographic illumination system

US9341953B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Markus Deguenther · Aalen, DE
• Michael Layh · Altusried, DE
• Michael Gerhard · Aalen, DE
• Bruno Thome · Aalen, DE
• Wolfgang Singer · Aalen, DE

Key dates

• Filing date: Feb 27, 2014
• Grant date: May 17, 2016
• Expiry date: Jul 3, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70191
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination.