Feature etching using varying supply of power pulses
US9401263B2 · kind B2 · utility
1Cited by
23References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2013 |
| Grant date | Jul 26, 2016 |
| Priority date | — |
| Expiry date | Mar 12, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3348
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Etching a feature of a structure by an etch system is facilitated by varying supply of radio frequency (RF) power pulses to the etch system. The varying provides at least one RF power pulse, of the supplied RF power pulses, that deviates from one or more other RF power pulses, of the supplied RF power pulses, by at least one characteristic.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.