Patent · US Active

Compositions comprising base-reactive component and processes for photolithography

US9436082B2 · kind B2 · utility

1Cited by

0References

9Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Deyan Wang · Hudson, US
Shintaro Yamada · Shrewsbury, US
Cong Liu · Lanzhou, CN
Mingqi Li · Sammamish, US
Joon Seok Oh · Natick, US
Chunyi Wu · Shrewsbury, US
Doris Kang · Shrewsbury, US
Cheng-Bai Xu · Upton, US

Key dates

Filing date	Dec 30, 2011
Grant date	Sep 6, 2016
Priority date	—
Expiry date	Dec 30, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/30
WIPO fieldOptics
WIPO sectorInstruments

Abstract

New photoresist compositions are provided that comprise one or more materials that have base-reactive groups and are particularly useful for dry lithography. Particularly preferred photoresists of the invention can exhibit reduced defects following development of a coating layer of the resist.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.