Dual plenum, axi-symmetric showerhead with edge-to-center gas delivery

US9447499B2 · kind B2 · utility

Assignee

• Novellus Systems, Inc. · US

Inventors

• Shambhu N. Roy · Roseville, US
• Vincent E. Burkhart · Cupertino, US
• Natan Solomon · Sunnyvale, US
• Sanjay Gopinath · Fremont, US
• Kaihan Ashtiani · San Jose, US
• Bart van Schravendijk · Sunnyvale, US
• Jason Stevens · Los Altos, US
• Dhritiman Subha Kashyap · Bengaluru, IN
• David Cohen

Key dates

• Filing date: Jun 22, 2012
• Grant date: Sep 20, 2016
• Expiry date: Dec 11, 2034

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45574
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A dual-plenum showerhead for semiconductor processing operations is provided. The showerhead may include a faceplate with two sets of gas distribution holes, each set fed by a separate plenum. One set of gas distribution holes may be through-holes in the faceplate of the showerhead and may allow gases trapped between the faceplate and a plasma dome to flow towards a wafer. The other set of gas distribution holes may distribute gas routed through passages or channels in the faceplate towards the wafer. The passages or channels in the faceplate may include radial channels and annular channels and may be fed from an annular gas distribution channel about the periphery of the faceplate.