Inventor · Sunnyvale, CA, US

Bart van Schravendijk

12Patents

11h-index

30Co-inventors

64Inventor score

Filing activity: Dec 9, 2010 → Feb 7, 2017

Most-cited inventions

Patent	Title	Area	Cited by	Status
US8592328B2	Method for depositing a chlorine-free conformal sin film	Electricity	105	Active
US8999859B2	Plasma activated conformal dielectric film deposition	Electricity	55	Active
US8685867B1	Premetal dielectric integration process	Electricity	32	Active
US8846536B2	Flowable oxide film with tunable wet etch rate	Electricity	31	Active
US9070555B2	Method for depositing a chlorine-free conformal sin film	Electricity	29	Active
US9570274B2	Plasma activated conformal dielectric film deposition	Electricity	29	Active
US10043655B2	Plasma activated conformal dielectric film deposition	Electricity	23	Active
US8728958B2	Gap fill integration	Electricity	22	Active
US9447499B2	Dual plenum, axi-symmetric showerhead with edge-to-center gas delivery	Chemistry; Metallurgy	17	Active
US9670579B2	Method for depositing a chlorine-free conformal SiN film	Electricity	15	Active
US9257302B1	CVD flowable gap fill	Electricity	13	Active
US9299559B2	Flowable oxide film with tunable wet etch rate	Electricity	10	Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.