Method and system for universal target based inspection and metrology
US9576861B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 18, 2013 |
| Grant date | Feb 21, 2017 |
| Priority date | — |
| Expiry date | Dec 4, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/398
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Universal target based inspection drive metrology includes designing a plurality of universal metrology targets measurable with an inspection tool and measurable with a metrology tool, identifying a plurality of inspectable features within at least one die of a wafer using design data, disposing the plurality of universal targets within the at least one die of the wafer, each universal target being disposed at least proximate to one of the identified inspectable features, inspecting a region containing one or more of the universal targets with an inspection tool, identifying one or more anomalistic universal targets in the inspected region with an inspection tool and, responsive to the identification of one or more anomalistic universal targets in the inspected region, performing one or more metrology processes on the one or more anomalistic universal metrology targets with the metrology tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.